Lasertec Corporation은 일본, 한국, 대만, 기타 아시아 및 미국에서 검사 및 측정 장비의 설계, 제조, 판매 사업을 영위하고 있습니다. 이 회사는 반도체 관련 제품으로 Actinic EUV patterned mask inspection system, EUV mask blanks inspection and review system, mask inspection system, mask blanks inspection and review system, EUV pellicle inspection system, EUV mask backside inspection and cleaning system, mask edge inspection system 등을 포함한 마스크 검사 시스템을 제공합니다. 또한 phase-shift and transmittance measurement system, phase-shift measurement system과 같은 위상 변이 및 투과율 측정 시스템, SiC wafer inspection and review system, GaN wafer inspection and review system, high sensitivity under-layer defect inspection and review system, multi-wavelength wafer inspection system, high sensitivity wafer edge inspection system, wafer edge-dimension measurement system, via depth measurement system, TSV back grinding process measurement system, fully automated wafer measurement system 등의 웨이퍼 검사 및 측정 시스템도 제공합니다. 이 외에도 FPD photomask inspection system, pellicle inspection and pellicle mounting system for CLIOS, FPD mask blanks inspection system 등을 제공하며, laser microscopes, electro-chemical reaction visualizing confocal system, in-situ observation at ultra high temperature confocal scanning laser microscope 등의 현미경도 제공합니다. 이 회사는 이전에 NJS Corporation으로 알려졌으며, 1986년에 Lasertec Corporation으로 사명을 변경했습니다. Lasertec Corporation은 1960년에 설립되었으며, 일본 요코하마에 본사를 두고 있습니다.
Lasertec Corporation engages in the design, manufacture, and sale of inspection and measurement equipment in Japan, South Korea, Taiwan, Other Asia, the United States. The company offers semiconductor related products, including Actinic EUV patterned mask inspection system, EUV mask blanks inspection and review system, mask inspection system, mask blanks inspection and review system, EUV pellicle inspection system, EUV mask backside inspection and cleaning system, and mask edge inspection system; phase-shift and transmittance measurement system, phase-shift measurement system; SiC wafer inspection and review system, GaN wafer inspection and review system, high sensitivity under-layer defect inspection and review system, multi-wavelength wafer inspection system, high sensitivity wafer edge inspection system, wafer edge-dimension measurement system, via depth measurement system, TSV back grinding process measurement system, and fully automated wafer measurement system. It also provides FPD photomask inspection system, pellicle inspection and pellicle mounting system for CLIOS, and FPD mask blanks inspection system; and microscopes, such as laser microscopes, electro-chemical reaction visualizing confocal system, and in-situ observation at ultra high temperature confocal scanning laser microscope. The company was formerly known as NJS Corporation and changed its name to Lasertec Corporation in 1986. Lasertec Corporation was founded in 1960 and is headquartered in Yokohama, Japan.